Sensibilidad Fotorrefractiva en la Mezcla de Cuatro Ondas
Resumen
Texto completo:
ART 5Referencias
Ashkin, A., Boyd, B., Dziedzie,J.S. Optically-Induced Refractive index inhomogeneities in LiNbO3 and LiTaO3, Appl. Phys, 9, 72, 1966.
Solymar, L, et al, The physics and applications of photorefractive materials. New York: Oxford University Press Inc, 1996.
Yeh, P, Introduction to photorefractive nonlinear optics. New York: John Wiley & Sons, Inc., 1993.
Yeh, P, Fundamental limit of the speed of photorefractive effect and its impact on device applications and material research, App. Opt., 26, 602, 1987.
Kukhtarev, N, et al, Holographic storage in electrooptic crystals, I. steady state, Ferroelectrics, Vol. 22, (1979), p. 949.
Frejlich, J., Photorefractive Materials, Fundamental Concepts, Holographic recording and Materials Characterization, John Wiley & Sons, Inc. USA, 2007
Gunter, P. and Huignargd J. P., Photo Refractive Materials and their Applications, vol. I. Springer-Verlag, Berlin,1988.
DOI: https://doi.org/10.24054/01204211.v1.n1.2013.840
Enlaces refback
- No hay ningún enlace refback.